Intel claims its Intel 4 node, its first to use EUV lithography, offers 21.5% higher frequencies or 40% power reduction vs Intel 7, up to 2x transistor density (Paul Alcorn/Tom's Hardware)

Intel claims its Intel 4 node, its first to use EUV lithography, offers 21.5% higher frequencies or 40% power reduction vs Intel 7, up to 2x transistor density (Paul Alcorn/Tom's Hardware)

Intel claims its Intel 4 node, its first to use EUV lithography, offers 21.5% higher frequencies or 40% power reduction vs Intel 7, up to 2x transistor density (Paul Alcorn/Tom's Hardware)

Intel claims its Intel 4 node, its first to use EUV lithography, offers 21.5% higher frequencies or 40% power reduction vs Intel 7, up to 2x transistor density (Paul Alcorn/Tom's Hardware) https://bit.ly/3NPt6Pe

Paul Alcorn / Tom's Hardware:
Intel claims its Intel 4 node, its first to use EUV lithography, offers 21.5% higher frequencies or 40% power reduction vs Intel 7, up to 2x transistor density  —  Intel announced the first details of its ‘Intel 4’ process node and shared an image of a Meteor Lake processor's compute die at the 2022 IEEE VLSI Symposium.


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